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Physics of electro-thermal effects in ESD protection devices

机译:ESD保护设备中电热效应的物理性质

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摘要

Damage in ESD protection devices can be caused by high local temperatures resulting from heat generation by an ESD pulse. In order to obtain physical insight into the process that leads to permanent damage, device simulations of coupled thermal and electrical behaviour have been performed. Additional to the potential and the electron and hole concentrations the lattice temperature is solved as a variable. Simulations of ESD pulses (forward bias) applied to a diode have been performed. The discharge mechanism could be visualised by using the coupled thermal/electrical model. Locations with considerable temperature rise that eventually lead to damage can be extracted from the calculated temperature distributions. Protection devices with optimum electrical and thermal characteristics can be designed by adjusting doping profiles and layout parameters. The buried layer of the protection device does not contribute in conducting current at high current levels. Therefore the buried layer is not functional in diodes that are subjected to ESD in forward bias. Measurements determining the ESD vulnerability of protection devices with and without buried layer confirm this fact.
机译:静电放电脉冲产生的热量会导致局部高温,从而导致静电放电保护设备的损坏。为了获得对导致永久性损坏的过程的物理了解,已执行了耦合热和电行为的设备仿真。除电势,电子和空穴浓度外,晶格温度也作为变量求解。已经对施加到二极管的ESD脉冲(正向偏置)进行了仿真。可以通过使用耦合的热/电模型来可视化放电机制。可以从计算出的温度分布中提取出温度升高幅度较大并最终导致损坏的位置。可以通过调整掺杂分布和布局参数来设计具有最佳电气和热特性的保护器件。保护装置的掩埋层不有助于在高电流水平下传导电流。因此,掩埋层在正向偏压下承受ESD的二极管中不起作用。确定带有和不带有掩埋层的保护设备的ESD脆弱性的测量证实了这一事实。

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